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The physics of metal oxide varistors
427
Citations
12
References
1975
Year
Materials ScienceSemiconductor TechnologyElectrical EngineeringEngineeringPhysicsNanoelectronicsOxide ElectronicsOxide SemiconductorsApplied PhysicsCondensed Matter PhysicsBias Temperature InstabilityConduction MechanismSemiconductor MaterialGross Ceramic MicrostructureNonlinear ConductivitySemiconductor Device
Varistor behavior is governed by the overall ceramic microstructure and the localized conduction processes occurring between grains. The paper outlines our current understanding of conduction mechanisms in ZnO‑based ceramic varistors, showing that the highly nonlinear conductivity is largely independent of composition or processing and arises from a microstructure of conducting grains separated by thin insulating oxide barriers. Breakdown conduction follows Fowler–Nordheim tunneling (J∝exp(−γ/F)), while at lower fields the process follows a thermally activated Schottky‑type law (J∝exp[−(Ei−β√F)/kT]) with Ei≈0.8 eV. Evidence shows the intergranular layer is ~100 Å thick, producing grain‑to‑grain fields of ~10^6 V/cm; analysis of temperature‑dependent I‑V data confirms the Fowler–Nordheim and Schottky models, and the commonly used empirical power‑law J=(F/K)^α is an approximation of the Fowler–Nordheim relation.
This paper outlines our present understanding of the conduction mechanisms and physical processes relevant to the performance of ZnO−based ceramic varistors. Varistor behavior is determined by the gross ceramic microstructure of the device as well as by the localized conduction processes which occur between grains. We show that the qualitative features of the highly nonlinear conductivity are largely independent of the details of varistor composition or processing but rather appear to be a general effect engendered by a microstructure of conducting grains surrounded by thin insulating oxide barriers. Evidence is presented from a variety of sources that this intergranular layer is ∼100 Å in thickness resulting in grain−to−grain fields of F∼106 V/cm. The conduction mechanism at breakdown is consistent with a Fowler−Nordheim tunneling process obeying a current−density−vs−field relation given by J∝exp(−γ/F), where γ is a constant. At somewhat lower fields (prebreakdown region) the conduction process follows a thermally activated Schottky−type law of the form J∝exp[−(Ei−β√F)/kT], where Ei?0.8 eV. Analysis of measured current−voltage characteristics at various temperatures in terms of these processes is a good representation of the data. The empirical power law behavior J= (F/K)α often used to describe varistor performance is shown to be an approximation of the Fowler−Nordheim relation.
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