Temperature Dependence of Nucleation Density of Chemical Vapor Deposition Diamond

Abstract

The temperature dependence of the nucleation density of Chemical Vapor Deposition diamond was carefully investigated by ellipsometric monitoring. Substrates were pre-treated by rubbing with diamond powder and then by wiping off the residual powder until visually clean. Nucleation density was greater than 10 10 /cm 2 in some ranges of temperature. It was also observed that nucleation density increased suddenly to 860°C and then gradually decreased in the range of higher temperatures. The results were explained by a change in the adsorption state of the precursor, from a physical to a chemical.