Publication | Open Access
Phase stability and decomposition products of Ti–Al–Ta–N thin films
64
Citations
29
References
2010
Year
Aluminium NitrideEngineeringSolid-state ChemistryThin Film Process TechnologyPhase StabilityQuaternary AlloysThin Film ProcessingMaterials EngineeringMaterials SciencePhysicsMicrostructureHigh Temperature MaterialsPhase EquilibriumApplied PhysicsCondensed Matter PhysicsAb Initio CalculationsAlloy DesignThin FilmsAlloy Phase
Ab initio calculations of quaternary alloys were used to predict the phase stability of (Ti1−xAlx)1−yTayN. Experimental observation of a dual phase structure containing wurtzite AlN and cubic Ti1−yTayN after thermal decomposition of sputter deposited thin films by vacuum annealing to 1400 °C is in excellent agreement with the calculated phase stabilities of the investigated compositions. We found positive mixing enthalpies for Ti1−xAlxN and Al1−yTayN, with maximum values of 0.25 eV/atom and 0.30 eV/atom, respectively, but negative values for Ti1−yTayN over the whole composition range. The difference in lattice parameters obtained from experiments and ab initio calculations is within ∼1%.
| Year | Citations | |
|---|---|---|
Page 1
Page 1