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Vacuum arc discharges preceding high electron field emission from carbon films
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1996
Year
EngineeringGlow DischargeElectric Field EnhancementVacuum DeviceChemical DepositionVacuum ArcNanoelectronicsPulsed Laser DepositionIon EmissionCarbon FilmsElectrical EngineeringPhysicsActivation StepMicroelectronicsSurface ScienceApplied PhysicsThin FilmsGas Discharge PlasmaOptoelectronicsElectrical Insulation
Field emission measurements on chemical vapor deposition diamond and laser ablated a-C films show an activation step after reaching a certain critical electric field. At this field a vacuum arc of some hundred ns duration initiates. While high current arcing leads to the evaporation of the spot surface melting, amorphization or cracking of the film is encountered for lower currents. In any case, much higher electron emission can be observed after this activation procedure due possibly to tip formation resulting in an electric field enhancement. By using a 1 GΩ resistance the discharge current can be limited nevertheless, an activation is observed.