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"Size Effect" in Electrical Resistivity Measurements on Single Crystals of High-Purity Tin at Liquid Helium Temperatures
13
Citations
2
References
1957
Year
Single CrystalsEngineeringCrystal Growth TechnologyElectrical Resistivity MeasurementsChemical EtchingResistorSize EffectMaterials SciencePhysicsCrystal MaterialHigh Purity TinHigh-purity TinSemiconductor MaterialElectrical PropertyCrystallographySpecific ResistanceSurface ScienceApplied PhysicsCondensed Matter Physics
The "size effect" in the electrical resistivity of a single crystal of high purity tin has been observed by reducing the cross-sectional area of the crystal by chemical etching. Assuming 100% diffuse scattering of the electrons at the boundaries, the mean free path is 0.45 mm, $\frac{{R}_{4.2\ifmmode^\circ\else\textdegree\fi{}\mathrm{K}}}{{R}_{273\ifmmode^\circ\else\textdegree\fi{}\mathrm{K}}}=3.5\ifmmode\times\else\texttimes\fi{}{10}^{\ensuremath{-}5}$, and $\ensuremath{\rho}l=2.3\ifmmode\times\else\texttimes\fi{}{10}^{\ensuremath{-}11}$ ohm ${\mathrm{cm}}^{2}$ along the $c$ axis.
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