Applied Physics Letters · 2005 · 65 citations · 14 references
EngineeringElectrical EngineeringMaterials ScienceElectronic MaterialsOptoelectronicsSemiconductor MaterialsCarrier TransportQuantum DotsQuantum TunnelingSemiconductor HeterostructuresSemiconductor PhysicsSemiconductor Thin FilmsAsymmetric BilayersCarrier DynamicsCarrier Transport In SemiconductorsElectronic TransportSemiconductor Quantum DotsThree-level ModelsTransport In HeterostructuresTransport In Semiconductors
Transient photoluminescence from a series of asymmetric InAs quantum-dot bilayers with a GaAs barrier layer thickness varying from 30 to 60 monolayers between the quantum-dot planes is investigated. The interdot carrier transfer process is analyzed. In the framework of a three-level system, interdot carrier transfer times between 200 and 2500ps are derived and compared with similar data from the literature. Within the semiclassical Wentzel–Kramers–Brillouin approximation, the observed “transfer time-barrier thickness-relation” supports nonresonant tunneling as the microscopic carrier transfer mechanism.
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Strain-induced material intermixing of InAs quantum dots in GaAs
M. O. Lipinski, Heinz Schuler, Oliver G. Schmidt et al. · Applied Physics Letters · 2000 · 123 citations