Concepedia

Low-pressure chemical vapor deposition of titanium and zirconium carbonitride thin films from M(NEt2)4 (M = Ti and Zr)

Chiu Hsin-Tien, Huang Cheng-Chung

Materials Letters · 1993 · 14 citations · 11 references

DOI

Concepts

References

11

Advanced inorganic chemistry

Choice Reviews Online · 1999 · 14.3K citations

, , +7

765. Metallo-organic compounds containing metal–nitrogen bonds. Part I. Some dialkylamino-derivatives of titanium and zirconium

D. C. Bradley, I. M. Thomas · Journal of the Chemical Society (Resumed) · 1960 · 251 citations

, , +11

Chemical vapor deposition of titanium, zirconium, and hafnium nitride thin films

Renaud M. Fix, Roy G. Gordon, David M. Hoffman · Chemistry of Materials · 1991 · 217 citations

, , +16

Synthesis of thin films by atmospheric pressure chemical vapor deposition using amido and imido titanium(IV) compounds as precursors

Renaud M. Fix, Roy G. Gordon, David M. Hoffman · Chemistry of Materials · 1990 · 177 citations

, , +12

Titanium, zirconium, and hafnium tetrahydroborates as "tailored" CVD precursors for metal diboride thin films

James A. Jensen, John E. Gozum, Deborah M. Pollina et al. · Journal of the American Chemical Society · 1988 · 143 citations

, , +9