Publication | Closed Access
The Chemical Vapor Deposition of Nickel Phosphide or Selenide Thin Films from a Single Precursor
216
Citations
22
References
2008
Year
Materials ScienceMaterials EngineeringIi-vi SemiconductorEngineeringNanomaterialsNanotechnologySurface ScienceApplied PhysicsSingle PrecursorChemistryThin FilmsPulsed Laser DepositionChemical DepositionDeposition TemperatureChemical Vapor DepositionThin Film ProcessingNickel PhosphideSingle Source Precursor
Nickel phosphide, nickel selenide thin films and their heterostructure (Ni0.85Se/Ni2P) were deposited from a newly synthesized single source precursor {Ni[iPr2P(S)NP(Se)iPr2]2} just by altering the deposition temperature using CVD.
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