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Molecular beam epitaxial growth of low-resistivity ZnSe films
71
Citations
8
References
1979
Year
Materials ScienceSemiconductorsLuminescence IntensityIi-vi SemiconductorEngineeringElectronic MaterialsPhotoluminescenceEpitaxial GrowthOptoelectronic MaterialsApplied PhysicsLow-resistivity Znse FilmsOptoelectronic DevicesThin FilmsMolecular Beam EpitaxyLuminescence PropertyCompound SemiconductorSingle-crystalline Films
Single-crystalline films of low-resistivity ZnSe have been successfully grown by molecular beam epitaxy (MBE). The film shows good crystallinity, having a smooth and flat surface as revealed by RHEED and SEM investigations. The resistivity of as-grown MBE ZnSe is low (typically ∼1 Ω cm) and the mobility of the film is relatively high (typically ∼300 cm2/V sec) at room temperature. The concentrations of the residual electrically active donor and acceptor centers are ND =8×1016 cm−3 and NA=6×1016 cm−3, respectively. The strong blue band-edge photoluminescence peak is observed even at room temperature, and the luminescence intensity at longer wavelength is very weak.
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