Low temperature silicon nitride deposited by Cat-CVD for deep sub-micron metal–oxide–semiconductor devices - Concepedia

Concepedia

Publication | Closed Access

Low temperature silicon nitride deposited by Cat-CVD for deep sub-micron metal–oxide–semiconductor devices

20

Citations

13

References

2001

Year

Samadhan B. Patil, Alka Kumbhar, Parag C. Waghmare, V. Ramgopal Rao, Rajiv O. Dusane

Thin Solid Films

Materials ScienceSemiconductorsElectrical EngineeringLow Temperature SiliconEngineeringSemiconductor TechnologyApplied PhysicsSemiconductor Device FabricationSemiconductor Device

References

	Year	Citations

Page 1