Sputter deposited <i>c</i>-oriented LiNbO3 thin films on SiO2

Abstract

We present the development of a magnetron sputtering process for the fabrication of exclusively c-axis oriented LiNbO3 thin films on silicon substrates. The heterostructure consists of LiNbO3/Si3N4/SiO2/Si. The deposition of the Si3N4 film is key to obtaining exclusively c-oriented LiNbO3 thin films. The deposition conditions for the LiNbO3 are discussed.