Publication | Closed Access
Statistical approach for optimizing sputtering conditions of highly oriented aluminum nitride thin films
55
Citations
9
References
1998
Year
Materials ScienceMaterials EngineeringAluminium NitrideEngineeringSurface ScienceApplied PhysicsStatistical ApproachThin FilmsChemical DepositionMicroelectronicsChemical Vapor DepositionThin Film Processing
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