Diffusion and Atomic Hopping of N Atoms on Ru(0001) Studied by Scanning Tunneling Microscopy

Abstract

The dynamic behavior of N atoms adsorbed on a Ru(0001) surface was studied by scanning tunneling microscopy. N atoms formed by dissociation of NO molecules show an initial sharp concentration profile at atomic steps. Its decay was followed as a function of time, providing a quasicontinuum diffusion constant; the activation energy is 0.94 eV and the prefactor is $2\ifmmode\times\else\texttimes\fi{}{10}^{\ensuremath{-}2}\phantom{\rule{0ex}{0ex}}{\mathrm{cm}}^{2}{\mathrm{s}}^{\ensuremath{-}1}$. The diffusion constant was determined also at equilibrium, from statistical jumps of individual N atoms in a uniform overlayer, and is found to be identical to the Fickian value.