Publication | Closed Access
Hot-carrier instability in IGFET’s
100
Citations
4
References
1975
Year
Device ModelingElectrical EngineeringHot-carrier InstabilityEngineeringPhysicsNanoelectronicsElectronic EngineeringChannel RegionApplied PhysicsGate InsulatorBias Temperature InstabilityElectronic PackagingMicroelectronicsGate DielectricSemiconductor Device
Injection of hot carriers from the channel region into the gate insulator of an IGFET imposes design constraints on the device dimensions and operating voltages. A fraction of the injected charge is trapped in the gate dielectric, and an undesirable shift in the operating characteristics results. The magnitude of the shift is related to the device dimensions, operating voltages, and gate dielectric.
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