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Raman study of GaAs-In<i>x</i>Al1−<i>x</i> As strained-layer superlattices
36
Citations
9
References
1985
Year
Aluminium NitrideOptical MaterialsEngineeringSemiconductor NanostructuresSemiconductorsIi-vi SemiconductorOptical PropertiesQuantum MaterialsRaman StudyMolecular Beam EpitaxyEpitaxial GrowthMaterials SciencePhysicsCrystalline DefectsApplied PhysicsCondensed Matter PhysicsPhononObserved Frequency ShiftLayer Thicknesses
Raman spectroscopy has been used to study the lattice-mismatch strains in GaAs-InxAl1−xAs strained-layer superlattices grown by molecular beam epitaxy with the layer thicknesses of 10–200 Å and In content x of 0.11, 0.20, and 0.35. The strain-induced shifts of the longitudinal optic phonon modes indicate that the GaAs and InxAl1−xAs layers have the tensile and compressive strains, respectively, along the interfaces. The strain calculated from the observed frequency shift agrees with the lattice-mismatch strain given by the elastic theory.
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