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High quality narrow GaInAs/InP quantum wells grown by atmospheric organometallic vapor phase epitaxy
82
Citations
13
References
1986
Year
SemiconductorsQuantum ScienceIi-vi SemiconductorCategoryquantum ElectronicsGainas/inp QuantumEngineeringPhysicsApplied PhysicsCondensed Matter PhysicsQuantum MaterialsEnergy ShiftsFunction ApproximationMolecular Beam EpitaxyEpitaxial GrowthOptoelectronicsCompound SemiconductorSemiconductor Nanostructures
A series of GaInAs/InP quantum wells from 10 to 135 Å has been grown by atmospheric organometallic vapor phase epitaxy using pressure balancing techniques. These wells exhibit strong exciton peaks at 4 K and have quantized energy shifts of up to 326 meV. These energy shifts are compared with two simple finite well models (Kronig–Penney and envelope function approximation) using a conduction-band offset of Vc≊40% ΔEg(GaInAs) and are in close agreement with the latter model. The full width half-maximum linewidths indicate an average interface roughness of ≊1 monolayer.
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