Computer Simulation of Dendritic Electrodeposition

Abstract

We have generalized the single‐particle diffusion‐limited aggregation process to both multiparticles and aggregation on an initially smooth surface. The computer simulation is done as a function of "concentration" of the particles and the sticking coefficient to the surface. These parameters are correlated with electrochemical parameters such as overpotential, limiting current, exchange current, and electrolyte concentration. The correlations between the two sets of parameters permits direct comparison between simulation and experiment. The transition between "mossy" deposits and fully developed dendritic growth is recorded. The simulation reproduces the presence of a critical overpotential and an initiation time. The fundamental interdependence of these parameters and their dependence on the concentration of the electrolyte, quantitatively resemble that of the observed dendrite growth in electrodeposition of Zn and other metals.