Publication | Closed Access
An In Situ Synchrotron Study of Zinc Anode Planarization by a Bismuth Additive
55
Citations
38
References
2013
Year
EngineeringElectrode-electrolyte InterfaceChemistryIi-vi SemiconductorBismuth AdditiveChemical EngineeringNanoengineeringElectrochemical InterfaceCompound SemiconductorMaterials ScienceBattery Electrode MaterialsSitu Synchrotron StudySurface ElectrochemistryBismuth BuildupElectrochemical ProcessPpm BismuthElectrochemistryMetal AnodeApplied PhysicsZinc Anode PlanarizationBatteriesDetrimental Bismuth BuildupElectrochemical Surface Science
Cyclic voltammetry of zinc plated from flowing alkaline zincate electrolyte with a bismuth additive showed a marked mass transport effect during metal layer deplating. This bismuth was added as Bi2O3 and had a saturated concentration of 26 ppm bismuth. Using a small, transparent window flow cell the mechanism was studied in situ using synchrotron X-rays. X-ray microdiffraction revealed that the metal-electrolyte interface was bismuth rich, and bismuth behaved in a manner similar to a surfactant. Transmission X-ray microscopy revealed that in the presence of bismuth additive, 5 μm raised features on the metal layer were preferentially dissolved during deplating. However, macro-morphology experiments demonstrated that at 26 ppm a detrimental bismuth buildup occurred over many cycles. By reducing additive concentration to 3 ppm a metal layer was planarized compared to a no-additive control, while avoiding the bismuth buildup. These findings suggested that 3 ppm bismuth could be used to planarize zinc metal layers such as those in flow-assisted zinc batteries. However, concentration will need to be well-controlled.
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