Self-Assembled Nanosilicon/Siloxane Composite Films

Abstract

Transparent Si/SiOx nanocomposite films, spontaneously adsorbed on glass or quartz substrates from their colloidal suspensions via a sonication-assisted oxidation process, are presently reported. Individual nanosilicon particles (ca. 20 nm) appear to cover a significant part of the substrate along with agglomerates on the order of 50−80 nm in thickness. Kinetic studies indicate a rapid initial adsorption that slows down significantly after 3 h.