Carrier lifetime versus ion-implantation dose in silicon on sapphire

Fuad E. Doany, D. Grischkowsky, C.-C. Chi

Applied Physics Letters · 1987 · 211 citations · 12 references

Concepts

Abstract

We have measured the dependence of the free-carrier lifetime on O+ ion-implantation dose in silicon-on-sapphire. At low implant doses, the carrier trapping rate increased linearly with the trap density introduced by ion implantation. At doses above 3×1014 cm−2 the measured carrier lifetime reached a limit of 600 fs.

References

12