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Stimulated emission and time-resolved photoluminescence in rf-sputtered ZnO thin films
122
Citations
17
References
2004
Year
EngineeringSe ThresholdLaser ApplicationsOptoelectronic DevicesLuminescence PropertyHigh-power LasersTime-resolved PhotoluminescenceSemiconductor NanostructuresOptical PropertiesMaterials SciencePhotoluminescencePhysicsOxide ElectronicsOptoelectronic MaterialsExciton-exciton ScatteringApplied PhysicsThin FilmsOptoelectronicsRf Sputtering
Stimulated emission (SE) was measured from ZnO thin films grown on c-plane sapphire by rf sputtering. Free exciton transitions were clearly observed at 10 K in the photoluminescence (PL), transmission, and reflection spectra of the sample annealed at 950 °C. SE resulting from both exciton-exciton scattering and electron hole plasma formation was observed in the annealed samples at moderate excitation energy densities. The SE threshold energy density decreased with increasing annealing temperature up to ∼950 °C. The observation of low threshold exciton-exciton scattering-induced SE showed that excitonic laser action could be obtained in rf-sputtered ZnO thin films. At excitation densities below the SE threshold, time-resolved PL revealed very fast recombination times of ∼74 ps at room temperature, and no significant change at 85 K. The decay time for the SE-induced PL was below the system resolution of <45 ps.
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