Publication | Closed Access
Synthesis and characterization of crystalline films on silicon
56
Citations
18
References
1996
Year
Materials ScienceEngineeringElectron MicroscopyNanomaterialsNanotechnologySurface ScienceApplied PhysicsSubstrate SurfaceChemistryThin FilmsCrystalline FilmsChemical DepositionSuccessful Experimental SynthesisChemical Vapor DepositionSilicon On InsulatorThin Film Processing
We report the successful experimental synthesis of nearly pure crystalline - and films on a Si(100) substrate by bias-assisted hot-filament chemical vapour deposition. Scanning electron microscopy shows that the substrate surface is covered by polycrystalline clusters in size with a density of . Relative N/C compositions in the range 1.34 - 2.5 were obtained by energy-dispersive x-ray analysis. The lattice parameters a = 7.06 Å and c = 2.72 Å for , and a = 6.48 Å and c = 4.71 Å for were determined both by x-ray diffraction and by transmission electron microscopy. A buffer layer of was found.
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