Electroluminescence at Si band gap energy based on metal–oxide–silicon structures

Abstract

Room-temperature electroluminescence corresponding to Si band gap energy from metal–oxide–semiconductor structures on both p-type and n-type Si is observed. With very thin oxide grown by rapid thermal oxidation, the metal–oxide–semiconductor structures behave like light emitting diodes. Luminescence is observed under forward bias even with a current density as low as 0.67 A/cm2. The physical reason for the electroluminescence is discussed and attributed to the localized wave function that leads to the spread of momentum. As a result, the spread momentum causes the electron–hole radiative recombination to occur relatively easily.