Organometallic Chemical Vapor Deposition of Germanium from a Cyclic Germylene, 1,3-Di-<i>tert</i>-butyl-1,3,2-diazagermolidin-2-ylidine

Abstract

Investigations into the kinetics and mechanism of the thermal decomposition of the novel organometallic precursor 1,3-di-tert-butyl-1,3,2-diazagarmolidin-2-ylidine are reported. On the basis of these results, thin films of surprisingly pure amorphous germanium were deposited at temperatures between about 140 and 440 °C. A high selectivity of the deposition on a Si surface as compared with SiO2 was obtained.