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Effects of Ti–W codoping on the optical and electrical switching of vanadium dioxide thin films grown by a reactive pulsed laser deposition
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Citations
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References
2004
Year
Optical MaterialsEngineeringLaser DepositionOptoelectronic DevicesThin Film Process TechnologySemiconductorsOptical PropertiesPulsed Laser DepositionThin Film ProcessingMaterials ScienceElectrical SwitchingVo2 FilmOxide ElectronicsOptoelectronic MaterialsVo2 FilmsElectronic MaterialsSurface ScienceApplied PhysicsTitanium Dioxide MaterialsThin FilmsOptoelectronicsChemical Vapor Deposition
Thin films of thermochromic VO2, V1−xWxO2 and V1−x−yWxTiyO2 (x=0.014, and y=0.12) were synthesized onto quartz substrates using a reactive pulsed laser deposition technique. The films were then characterized by x-ray diffraction and x-ray photoelectron spectroscopy. The W and Ti dopant effects on the semiconductor-to-metal phase transition of VO2 were investigated by measuring the temperature dependence of their electrical resistivity and their infrared transmittance. Remarkably strong effects of Ti–W codoping were observed on both the optical and electrical properties of V1−x−yWxTiyO2 films. The IR transmittance was improved, while the transition temperature could be varied from 36°C for W-doped VO2 film to 60°C for Ti–W codoped VO2 film. In addition, at room temperature, a higher temperature coefficient of resistance of 5.12%∕°C is achieved. Finally, both optical and electrical hysteresis are completely suppressed by Ti–W codoping the VO2 films.
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