High reflectivity fibre gratings produced by incubateddamage using a 193 nm ArF laser

Abstract

High reflectivity gratings have been formed in optical fibre using a 193 nm ArF laser irradiated phase mask. Relatively high absorption in the fibre core at this wavelength coupled with an incubation effect in which the absorption grows with repeated exposure allows rapid grating formation (~10 pulses) at modest fluences (~400 m Jcm-2).