Concepedia

Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures

K. Ait Aissa, Amine Achour, J. Camus, L. Le Brizoual, Pierre-Yves Jouan, M.A. Djouadi

Thin Solid Films · 2013 · 94 citations · 30 references

DOI

Concepts

References

30

The tension of metallic films deposited by electrolysis

G. Stoney · Proceedings of the Royal Society of London Series A Containing Papers of a Mathematical and Physical Character · 1909 · 4.8K citations · Full text

, , +11

The microstructure of sputter‐deposited coatings

John A. Thornton · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 1.3K citations

, , +16

A novel pulsed magnetron sputter technique utilizing very high target power densities

V. Kouznetsov, K. Macák, Jochen M. Schneider et al. · Surface and Coatings Technology · 1999 · 1.1K citations

, , +7

On the film density using high power impulse magnetron sputtering

Mattias Samuelsson, Daniel Lundin, J. Jensen et al. · Surface and Coatings Technology · 2010 · 416 citations · Full text

, , +11

The thermalization of energetic atoms during the sputtering process

R.E. Somekh · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1984 · 305 citations · Full text

, , +14