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Comparison of the structural properties and residual stress of AlN films deposited by dc magnetron sputtering and high power impulse magnetron sputtering at different working pressures

Materials ScienceMaterials EngineeringDc Magnetron SputteringAln FilmsEngineeringAluminium NitrideMechanical EngineeringApplied PhysicsResidual StressThin Film Process TechnologyMicrostructure