Concepedia

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Submicrometer lithography of a silicon substrate by machining of photoresist using atomic force microscopy followed by wet chemical etching

DOI

17

Citations

19

References

1997

Year

Sam Fong Yau Li, H. T. Ng, P C Zhang, Pin Ho, Lei Zhou, Shi‐Xiang Chan
Nanotechnology

Abstract

10.1088/0957-4484/8/2/005

References

YearCitations

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