Determination of Fermi-level effect on Si-site distribution in GaAs : Si

Abstract

Silicon-site distribution in GaAs under the influence of a second dopant was studied by measuring the Si localized vibrational modes and the carrier concentrations of a series of samples. Each sample had the same total Si concentration, [Si], but with different concentrations of a second dopant. Semiquantitative results give a relationship between [SiGa]/ [SiAs] and the concentration of the second dopant which is compared with a calculation based on the thermodynamically predicted Fermi-level effect as formulated by Longini and Greene.