Holographic Design and Fabrication of Diamond Symmetry Photonic Crystals Via Dual‐Beam Quadruple Exposure

Abstract

Diamond symmetry structures (space group No. 227) with tunable lattice size are fabricated from epoxy-functionalized cyclohexyl polyhedral oligomeric silsesquioxane (POSS) by holographic lithography using dual-beam quadruple exposure configuration with careful consideration of the relative phase shift, wobble effect, and pre-compensation of the photoresist shrinkage. Calculation suggests that Si photonic crystals templated from the POSS structures, both directly converted and its inverse structure, offer the same and maximum complete PBGs in comparison to other holographically patterned diamond lattices. Holographic Design and Fabrication of Diamond Symmetry Photonic Crystals Via Dual-Beam Quadruple Exposure Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.