Publication | Closed Access
Experimental determination of the strain potentials on vicinal Si(001) surfaces
13
Citations
17
References
1992
Year
EngineeringElectron DiffractionSilicon On InsulatorSiliceneSurface ReconstructionMaterials SciencePhysicsCrystalline DefectsDefect FormationSolid-state PhysicVicinal SiSurface CharacterizationSurface AnalysisSurface ScienceApplied PhysicsCondensed Matter PhysicsStep StructureHigh TemperatureHigh Strain Rate
High-resolution low-energy electron diffraction measurements of the step structure of vicinal Si(001) as a function of both miscut angle and temperature are analyzed in terms of a one-dimensional model describing an ${\mathit{S}}_{\mathit{B}}$ step moving in the potential existing between two straight ${\mathit{S}}_{\mathit{A}}$ steps. The model includes kink and corner energies plus a generic strain potential caused by the surface reconstruction and the rebonding of atoms at the steps. Fits to the data confirm that the strength of the direct step-step interaction between steps increases continuously as the mean terrace width diminishes. At high temperature and large miscut angles, a one-dimensional model becomes unsatisfactory. Meandering of the ${\mathit{S}}_{\mathit{A}}$ steps even for very narrow terrace widths is the likely cause.
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