Publication | Closed Access
Light emission and negative differential conductance of n-type nanoporous silicon with buried p-layer assistance
13
Citations
25
References
2007
Year
N-type Nanoporous SiliconChemical EngineeringElectrical EngineeringEngineeringNanoporous MaterialNanoelectronicsBuried P LayerApplied PhysicsSemiconductor MaterialSemiconductor Device FabricationSilicon On InsulatorMicroelectronicsAnisotype JunctionOptoelectronicsLight EmissionSemiconductor DeviceNegative Differential Conductance
The light-emission and current-voltage properties of n-type nanoporous silicon (n-NPS) with a hole assistance of buried p layer are explored. The influences of anodic current density on the formation, morphology, and properties of n-NPS are measured. Such n-NPS films have nanoscaled pores and high-aspect-ratio pillars. Since the anisotype junction is forward biased during the anodization process, many holes can drift straightupward from p layer and participate in the electrochemical reaction. At room temperature, high peak-to-valley current ratios of about 117.3 can be obtained in negative difference conductance region as well as strong visible light emissions are clearly observed under ultraviolet excitation.
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