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Deposition of SiO2 films by low-energy ion-beam induced chemical vapor deposition using hexamethyldisiloxane

DOI

24

Citations

9

References

2003

Year

Takaomi Matsutani, Tatsuya Asanuma, Chang Liu, Masato Kiuchi, Takae Takeuchi
Surface and Coatings Technology

References

YearCitations

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