Publication | Open Access
Controlled growth of GaN nanowires by pulsed metalorganic chemical vapor deposition
61
Citations
25
References
2005
Year
Materials ScienceAluminium NitrideEngineeringPhysicsNanotechnologyControlled GrowthApplied PhysicsX-ray DiffractionAluminum Gallium NitrideGan Power DeviceReproducible GrowthCategoryiii-v SemiconductorGan NanowiresChemical Vapor DepositionSemiconductor Nanostructures
Controlled and reproducible growth of GaN nanowires is demonstrated by pulsed low-pressure metalorganic chemical vapor deposition. Using self-assembled Ni nanodots as nucleation sites on (0001) sapphire substrates we obtain nanowires of wurtzite-phase GaN with hexagonal cross sections, diameters of about 100nm, and well-controlled length. The nanowires are highly oriented and perpendicular to the growth surface. The wires have excellent structural and optical properties, as determined by x-ray diffraction, cathodoluminescence, and Raman scattering. The x-ray measurements show that the nanowires are under a complex strain state consistent with a superposition of hydrostatic and biaxial components.
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