Simulation and optimization of silicon thermal CVD through CFD integrating Taguchi method

A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor

Michael E. Coltrin, Robert J. Kee, James A. Miller · Journal of The Electrochemical Society · 1984 · 338 citations

Engineering, Fluid Mechanics, Reactor Physics +19

A Mathematical Model of Silicon Chemical Vapor Deposition: Further Refinements and the Effects of Thermal Diffusion

Michael E. Coltrin, Robert J. Kee, James A. Miller · Journal of The Electrochemical Society · 1986 · 271 citations

Engineering, Chemical Deposition, Silicon On Insulator +18

A Mathematical Model of the Fluid Mechanics and Gas‐Phase Chemistry in a Rotating Disk Chemical Vapor Deposition Reactor

Michael E. Coltrin, Robert J. Kee, Greg H. Evans · Journal of The Electrochemical Society · 1989 · 236 citations

Engineering, Fluid Mechanics, Reactor Physics +17

A Model of Silicon Carbide Chemical Vapor Deposition

Mark D. Allendorf, Robert J. Kee · Journal of The Electrochemical Society · 1991 · 194 citations

Materials Engineering, Materials Science, Engineering +12

Die casting process optimization using Taguchi methods

G. P. Syrcos · Journal of Materials Processing Technology · 2003 · 173 citations

Process Intensification, Engineering, Industrial Engineering +5