Journal of Materials Chemistry · 2001 · 77 citations · 30 references
Natural SciencesChemistryMaterials ScienceInorganic ChemistryMaterials ChemistryThin FilmsAerosol ChemistryMetal SulfidesSulfur ChemistrySulfur CompoundsSulfur OxidesThin-film DepositionLead SulfidesMetal Sulfide Thin FilmsPrecursor ChemistrySurface Chemistry Of Metal SulfidesTin Oxides
AACVD (aerosol-assisted chemical vapour deposition) using (PhS)4Sn as precursor leads to the deposition of Sn3O4 in the absence of H2S and tin sulfides when H2S is used as co-reactant. At 450 °C the film deposited consists of mainly SnS2 while at 500 °C SnS is the dominant component. The mechanism of decomposition of (PhS)4Sn is discussed and the structure of the precursor presented.
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Infrared and Raman spectra of the IV-VI compounds SnS and SnSe
H. R. Chandrasekhar, R.G. Humphreys, Uri Zwick et al. · Physical review. B, Solid state · 1977 · 537 citations