Reactivities of ultrathin alumina films exposed to intermediate pressures of H2O: Substrate-mediated mechanism for growth and loss of surface order - Concepedia

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Reactivities of ultrathin alumina films exposed to intermediate pressures of H2O: Substrate-mediated mechanism for growth and loss of surface order

14

Citations

34

References

2007

Year

Jeffry A. Kelber, N.P. Magtoto, Chiranjeevi Vamala, Manjari Jain, D. R. Jennison, Peter A. Schultz

Surface Science

Materials ScienceAluminium NitrideMaterial AnalysisEngineeringSurface ChemistrySurface ScienceApplied PhysicsSurface OrderIntermediate PressuresThin FilmsUltrathin Alumina FilmsSurface Reactivity

References

	Year	Citations

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