Publication | Closed Access
First step towards the growth of single-crystal oxides on Si: Formation of a two-dimensional crystalline silicate on Si(001)
60
Citations
12
References
2001
Year
Single-crystal OxidesEngineeringTwo-dimensional Crystalline SilicateCrystal Growth TechnologyChemistrySilicon On InsulatorChemical EngineeringFirst StepNanoelectronicsSiliceneChemical PropertiesEpitaxial GrowthThin Film ProcessingMaterials ScienceMaterials EngineeringNanotechnologyOxide ElectronicsLow Temperature OxidationNanocrystalline MaterialNanomaterialsSurface ScienceApplied PhysicsThin FilmsDifferent Sr CoveragesAmorphous Solid
We have investigated the structural and chemical properties of reconstructed Sr/Si(001) surfaces at different Sr coverages using low energy electron diffraction, x-ray photoelectron spectroscopy, and scanning tunneling microscopy. The results show that upon low temperature oxidation and subsequent UHV annealing of the Sr/Si(001)-(2×1) surface, a crystalline Sr2SiO4 silicate-like layer formed. Using this layer as a template, single-crystal SrO thin films were grown on Si(001) substrates. Our results provide microscopic and spectroscopic evidence of the formation of a uniform, stable, two-dimensional crystalline silicate that can be used for growth of single-crystal oxides on Si(001) substrates.
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