Journal of Materials Chemistry · 2005 · 141 citations · 14 references
Thin Film PhysicsEngineeringTungsten Selenide FilmsSurface NanotechnologyThin Film Process TechnologyChemistryChemical DepositionChemical EngineeringThin Film ProcessingMaterials ScienceWater DropletsNatural SciencesSurface ScienceApplied PhysicsMaterials CharacterizationX-ray DiffractionInterfacial PhenomenaThin FilmsChemical Vapor Deposition
Atmospheric pressure chemical vapour deposition (APCVD) of tungsten selenide films on glass substrates was achieved by reaction of diethyl selenide with WCl6 at 500–650 °C. X-Ray diffraction showed that the WSe2 films were crystalline with cell constants close to those expected—some preferred orientation was noted at higher deposition temperature. Energy-dispersive analysis by X-rays (EDAX) gave a W ∶ Se ratio close to 1 ∶ 2 for all the films formed at 550 °C. The films were matt black in appearance, were adhesive, passed the Scotch tape test but could be scratched with a steel scalpel. SEM showed that the films were composed of either plate or needle like crystals which become longer and thicker with increasing deposition temperature. The films were highly hydrophobic with contact angles for water droplets in the range of 135–145°. Furthermore these surfaces were highly adherent for water droplets—that did not roll or slide even at a tilt angle of 90°.
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Wettability of porous surfaces
A. B. D. Cassie, S. Baxter · Transactions of the Faraday Society · 1944 · 13.2K citations
RESISTANCE OF SOLID SURFACES TO WETTING BY WATER
Robert N. Wenzel · Industrial & Engineering Chemistry · 1936 · 12.8K citations
Superhydrophobic Aligned Polystyrene Nanotube Films with High Adhesive Force
Ming Jin, Xinjian Feng, Lei Feng et al. · Advanced Materials · 2005 · 717 citations
Materials Science, Native Polystyrene Surfaces, Engineering +15