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Preparation of ferroelectric BaTiO3 thin films by activated reactive evaporation
183
Citations
18
References
1990
Year
Materials ScienceMaterials EngineeringMultiferroicsChemical EngineeringOxide HeterostructuresElectrical EngineeringActivated Reactive EvaporationDielectric ConstantEngineeringOxide ElectronicsFerroelectric ApplicationFerroelectric MaterialsSrtio3 Single CrystalThin FilmsFunctional Materials
Ferroelectric BaTiO3 thin films were directly and epitaxially grown on SrTiO3 single crystal and epitaxial Pt film substrates by activated reactive evaporation. The substrate temperature was around 600 °C. For (100) oriented as-grown films, a typical ferroelectric hysteresis loop and a maximum of dielectric constant at about 115 °C were observed. The resistivity was as high as 109 Ω cm and the breakdown voltage was 2.7 MV/cm for as-grown BaTiO3 films.
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