Publication | Closed Access
Dust particle formation in low pressure Ar/CH4 and Ar/C2H2 discharges used for thin film deposition
61
Citations
14
References
2003
Year
Materials ScienceChemical EngineeringLow Pressure Ar/ch4EngineeringSurface ScienceApplied PhysicsDust Particle FormationDust ScienceChemical Vapor DepositionAir PollutionDusty PlasmaPlasma ProcessingGas Discharge PlasmaThin Film Deposition
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