Publication | Closed Access
Tribological and electrical properties of metal-containing hydrogenated carbon films
256
Citations
4
References
1987
Year
Materials ScienceMaterials EngineeringCarbon FilmsRoom TemperatureEngineeringTribological CoatingCarbon-based MaterialCorrosionReactive Sputtering ProcessSurface ScienceApplied PhysicsElectrical ConductivityThin FilmsChemical DepositionCarbon-based FilmsTribocorrosionThin Film Processing
The formation of metal-containing amorphous hydrogenated carbon films (a-C:H) in a reactive sputtering process is reported. The layers were prepared at room temperature using various metals of different concentrations. According to tribological measurements the layers exhibit small friction values and an extremely low abrasive wear rate. The electrical conductivity depends on the metal concentration and could be varied over many orders of magnitude.
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