Simple activated transport in ion-implanted Si:As at temperatures below 0.5 K - Concepedia

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Simple activated transport in ion-implanted Si:As at temperatures below 0.5 K

18

Citations

10

References

1991

Year

R. W. van der Heijden, G. Chen, A.T.A.M. de Waele, H.M. Gijsman, F.P.B. Tielen

Solid State Communications

Electrical EngineeringIon ImplantationEngineeringPhysicsApplied PhysicsIon-implanted SiTransport PhenomenaSilicon On InsulatorCharge Carrier TransportIon Process

References

	Year	Citations

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