Metal deposition at 532 nm using a laser transfer technique

Abstract

The laser-induced forward transfer technique in which material is ablatively transferred from a thin film to a target substrate by a pulsed excimer laser has been extended to 532 nm using a frequency-doubled YAG laser. Cu and Ag have been deposited on fused silica substrates using microscope objectives for focusing, resulting in reductions in feature size over that obtainable with the multimode excimer laser. The photothermal deposition process has been modeled using the one-dimensional thermal diffusion equation, including a moving solid-melt boundary, with good agreement between theoretical and experimental results.