Sputtering Experiments with 1- to 5-keV Ar+ Ions. II. Monocrystalline Targets of Al, Cu, and Au

Abstract

Sputtering yields have been measured during normally incident 1- to 5-keV Ar+ ion irradiation of polycrystalline Au, 〈100〉, 〈110〉, and 〈111〉 Au monocrystals, a 〈111〉 Al monocrystal, and several 〈0kl〉 Cu monocrystals of previously unreported orientations. Onderdelinden's transparency model is found to account satisfactorily for the orientation dependence of the yields of low-index Cu, Au, and Ge crystals. The importance of the recording geometry in governing the appearance of sputtering ejection patterns is demonstrated. The so-called 〈114〉 ejection-pattern spots from 〈111〉 fcc crystals are attributed to assisted focusing sequences along 〈100〉, the most probable ejection direction being shifted because the last focusing ``lens'' is incomplete.