Publication | Open Access
Extremely low threshold current strained InGaAs/AlGaAs lasers by molecular beam epitaxy
85
Citations
5
References
1991
Year
Optical MaterialsEngineeringLaser ApplicationsLaser MaterialOptoelectronic DevicesIngaas/algaas LasersHigh-power LasersSemiconductor LasersStrained Layer Ingaas/algaasMolecular Beam EpitaxyMaterials SciencePhotonicsPhysicsLaser DiodesAluminum Gallium NitrideCategoryiii-v SemiconductorApplied PhysicsThreshold Current DensityOptoelectronics
Using solid source molecular beam epitaxy we have grown strained layer InGaAs/AlGaAs graded index separate confinement heterostructure lasers operating at 1.01 μm. For broad-area, uncoated Fabry–Perot devices with cavity lengths in excess of 3000 μm, the threshold current density is 56 A/cm2, a value which we believe to be the lowest ever reported for laser diodes in any materials system. The internal quantum efficiency for these lasers is 88%, while the materials losses are 1.8 cm−1.
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