Silicon molecular beam epitaxy with simultaneous ion implant doping

Abstract

Silicon epitaxial layers have been made with virtually any doping profile by combining molecular beam epitaxial growth with simultaneous ion implant doping. Arsenic ions (As+) accelerated to energies between 400 and 800 eV have shown a high sticking coefficient on the heated silicon surface. Growth conditions have been defined at which epitaxial films with bulk characteristics are obtained.