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Formation of Nanosized TiO2 in Mesoporous Silica Thin Films

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2002

Year

Abstract

Nanosized TiO2 particles are incorporated into pore channels of mesoporous silica thin films (MSTFs) by a simple constituent-template displacement process, consisting of depositing MSTF on quartz slides, treatment with Ti(OBu)4, and heating. Ti is present in two coordination states, an anatase-like nanosized TiO2 phase, and isolated [TiO4] units in the framework or on the surface of the film. The Figure shows an HREM image of TiO2/MSTF.