The impact of increased deformation potential at MOS interface on quasi-ballistic transport in ultrathin channel MOSFETs scaled down to sub-10 nm channel length

Abstract

It is a common view that ballistic transport is enhanced due to channel length scaling because of decreased scattering number. In this study, based on Monte Carlo (MC) simulation technique, we have successfully extracted quasi-ballistic transport parameters such as backscattering coefficient, by carefully monitoring particle trajectories around the potential bottleneck point. We have found that contrary to expectations, ballistic transport in ultra-scaled double-gate (DG) MOSFETs is not enhanced mainly due to intensified surface roughness (SR) scattering if the channel length reduces less than 10 nm.