Different Polymerizing Characteristics of Ar/He Atmospheric Pressure Plasma Jets at Room Temperature

Xu Zheng, Guangliang Chen, Zhaoxia Zhang, Guohua Lv, Jennifer Beem, Sylvain Massey, Michaël Tatoulian

Plasma Processes and Polymers · 2013 · 16 citations · 38 references

Concepts

Abstract

Abstract In this paper, the different discharge and polymerizing characteristics of Ar and He atmospheric pressure plasma jets (APPJs) were studied. The as‐deposited polymer of acrylic acid (PAA) on silk fibroin film (SFF) by APPJs with Ar/O 2 and He/O 2 gases is investigated with AFM, FESEM and XPS. Optical emission spectroscopy (OES) measurements indicated that various reactive radicals, such as OH and O as well as some acrylic acid (AA) particles existed in the plasma jets. AFM images showed that the He/O 2 plasma‐deposited films had the most homogeneous characteristics and good water resistance properties. The cross‐sections of silicon substrates obtained by FESEM showed that the deposition rates of PAA were 50 nm · min −1 and 15 nm · min −1 for Ar/O 2 and He/O 2 plasmas, respectively. Also, according to XPS analysis, He/O 2 plasma created a higher concentration of carboxyl groups on the deposited film than when Ar/O 2 plasma was used. magnified image

References

38